ИСТИНА

• Охват: Международная
• Даты проведения: 19-23 сентября 2016
• Место проведения: Вена, Austria
• Число участников: 100
• Веб-сайт: http://mne2016.org/
• Описание конференции:

  MNE 2016 is the 42nd international conference on micro- and nanofabrication and manufacturing using lithography and related techniques with around 700 participants. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends in the fabrication and application of micro- and nanostructures and devices. Applications in electronics, photonics, electromechanics, environment, life sciences and biology are also discussed. Electronic systems will continue to shape our future. Micro- and Nano-Engineering is at the heart of this development enabling micro- and nano-electronics, embedded, cyber-physical as well as integrated systems. It is indispensable for applications such as automated driving, internet of things, intelligent infrastructures as well as digital revolution in industry. At least ten percent of the gross domestic product throughout Europe depends on Micro- and Nano-Engineering. This broad spectrum is also reflected in the selection of outstanding plenary speakers at MNE 2016. In addition, 17 world-Ieading invited speakers will reflect modern topics in the four MNE categories: micro- and nanopatterning, micro- and nanofabrication, micro/nano devices and systems, and micro- and nanotechnology/engineering for life sciences and biology.

• Добавил в систему: Зотович Алексей Иванович

Доклады:

• 2016 Advanced Etching for Nano-devices and 2D materials (Устный)
• Авторы: de Marneffe Jean-Francois, Ivo Rangelow, Andy Goodyear, Braithwaite N.St, Yvonne Sutton, Mark Bowden, Efrain Altamirano-Sanchez, Alexey Zotovich, Otell Zaid El, Boon Teik Chan, Knoll Armin W., Colin Rawlings, Duerig U., Martin Spieser, Kesthner M., Christian Neuber, Mike Cooke