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An interest in amorphous and textured Y2O3 thin films (2D sheets) is connected with their various applications as functional or buffer layers. Chemical Solution Deposition (CSD) is most promising method for obtaining 2D sheets. To deposit Y2O3 films we suggested new metal organic (MO) precursors on base of yttrium carboxylate and ethanolamines, polyethylenepolyamines, diglyme as solvents and ligands. This approach allows to vary within the requisite limits the concentration, viscosity of the solution, surface wettability and thermal stability of such precursors. Methods of 1H NMR and thermal analysis were used to characterize new precursors in solutions and thin films. Amorphous and crystalline films were deposited on MgO (001) substrate and Ni-5%W, Ni-Cr-W tapes by spin and drain coating techniques and annealed at 500 oC in air and 1000-1200oC in Ar+H2 correspondingly. The obtained films were characterized by EDX, XRD, AFM, their thickness was measured on cross section SEM images. Correlations between the composition of MO precursors, deposition and annealing conditions and characteristics of thin films have been shown up and discussed.