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In this study, the 81 MHz symmetric CCP discharge in quartz tube at increased pressures (10 to 100 Torr) was used to study O2 dissociation mechanism. The use of both spatially resolved and time-resolved actinometry technique on Kr in the modulated rf discharge allowed measuring atom loss frequency γlossO and dissociation degree and thereby determining dissociation rate constant kdissO2. The O atom loss is connected with surface recombination at lower pressure and volume reactions at the higher pressure. The variation of plasma parameters allowed studying the O2 dissociation and O atom loss mechanisms in a wide range of gas temperature from ~500 K up to 1800 K. The possible mechanism of increasing kdissO2 at low E/N as well as the role of ozone generation in γlossO is discussed in detail. This research is supported by Russian Foundation for Basic Research (RFBR) Grant No. 18-32-00932\18 and No. 16-52-16024.