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Use of ILT-based mask optimization for local printability enhancement доклад на конференции
- Авторы: Кобельков С.Г., Родин С.Б., Soung-Su Woo, Kyohei Sakajiri, Evgueni Egorov, Alexander Tritchkov
- Международная Конференция : Photomask Japan 2014
- Даты проведения конференции: 2014
- Тип доклада: Пленарный
- Докладчик: Alexander Tritchkov
- Место проведения: Yokohama, Japan, Japan
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Аннотация доклада:
In this paper we study the trade-offs and benefits of using ILT-based SRAF placement/OPC over conventional SRAF placement/OPC for various front-end and back-end design configurations on a full chip. We explore the use models and benefits of using ILT-based Local Printability Enhancement (LPE) in an automated flow to eliminate hot spots that can be present on the full chip after conventional SRAF placement/OPC. We study the impact on process-window, performance, and mask manufacturability. © (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
- Добавил в систему: Родин Сергей Борисович