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A comprehensive study of microwave (MW) activated CH4/H2/Ar(He) plasmas used for diamond chemical vapor deposition is reported, focusing on plasma-chemical mechanisms, power balance and effects of wide range variations of noble gas fractions in H/C/Ar (or He) mixtures. The experimental data of Bristol University (BU) (OES, CRDS, calorimetric data from water cooling contours) are complemented by extensive 2-D(r, z) modeling of the plasma chemistry, plasma parameters (electron energy distributions and reaction coefficients, spatial distributions of electron and ions concentrations, gas temperature), absorbed power transformations and global power balance.