Effects of faceted surface topography on high-fluence sputtering of graphiteстатья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 9 октября 2015 г.
Аннотация:Effects of ion-induced faceted surface relief on high-fluence sputtering of graphite under 30-keV Ar and 15-keV N ion bombardment have been studied by means of binary-collision computer simulation. Taking into account experimental observations of surface topography, the relief was modeled by an alpha-dependent ridge-like periodic function (alpha = the ion incidence angle measured from the normal to macroscopic surface plane). It was shown that for normal incidence the sputter yield S represents a non-monotonic function of the relief aspect ratio and is saturated at x ~ 100-200 nm (x = the half-period of the relief). The simulations stressed the importance of the relationship between the dimensions of surface roughness and atomic collision cascades and allowed to explain the S(alpha)-dependences found experimentally. It was shown that a strong (about 2 times) decrease of S at alpha = 60-80 deg is due to a shadowing mechanism which is also clearly revealed in the angular distribution of sputtered atoms.