Electrodischarge processes in K-208 and CMG glass exposed to 10–40 keV electronsстатья
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Дата последнего поиска статьи во внешних источниках: 20 апреля 2016 г.
Авторы:
Khasanshin R.H. ,
Novikov L.S. ,
Gatsenko L.S. ,
Volkova Y.B.
Журнал:
Inorganic Materials: Applied Research
Том:
6
Номер:
5
Год издания:
2015
Первая страница:
438
Последняя страница:
444
DOI:
10.1134/S2075113315050068
Аннотация:
Comparative analysis of the characteristics of electrostatic discharges occurring on the surface of K-208 and CMG glass exposed to 10–40 keV electrons at a flux density of 1010 to 2.5 × 1011 cm–2 s–1 in a vacuum is conducted. Discharges accompanied by plasma ejections into the surrounding medium and the formation of microprotrusions and discharge channels on the surface are observed for glass samples of both types; however, the conditions for the development of discharges and the sizes of the microstructures formed on the surface are significantly different for the K-208 and CMG glass samples irradiated under the same conditions. The observed differences in the development of discharges in the K-208 and CMG glass samples are attributed to the fact that the latter has a magnesium fluoride coating and exhibits a higher conductivity and a lower concentration of defects and dislocations than the former. © 2015, Pleiades Publishing, Ltd.
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