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Fictitious Particle Approach for Light Scattering Investigation from the Line Features of a Substrateстатья Глава в книге
Информация о цитировании статьи получена из
Web of Science
Дата последнего поиска статьи во внешних источниках: 16 января 2019 г.
- Авторы: Eremin Yu, Wriedt T.
- Сборник: The Generalized Multipole Technique for Light Scattering
- Редактор: Еремин Юрий Александрович
- Серия: Springer Series on Atomic, Optical, and Plasma Physics
- Том: 99
- Глава в коллективной монографии
- Год издания: 2018
- Издательство: Springer International Publishing AG
- Местоположение издательства: Cham, Switzerland
- Первая страница: 71
- Последняя страница: 92
- DOI: 10.1007/978-3-319-74890-0_4
- Аннотация: Computer simulation of light scattering from features on plane interfaces is of interest in the semiconductor and nanoelectronic industry. Submicrometer defects on silicon substrates are detected and characterized by in-line laser scanning surface inspection systems. A reliable computer model for predicting this light scattering would provide a flexible and efficient tool for efficient surface features detection and discrimination. Based on the Discrete Sources Method (DSM) a new fictitious particle concept has been elaborated and realized. Based on this conception an updated DSM computer model enables to analyze light scattering from line defects of a plane silicon substrate such as a line bump and a pit. Computer simulation results corresponding to the Scattering Cross-Section (SCS) for P/S polarized excitation are presented. It was found that the Total Scattering Cross-Section (TSC) can be change by an order of magnitude depending on the orientation of the linear feature with respect to the plane wave incident direction.
- Добавил в систему: Еремин Юрий Александрович