Effect of substrate material on the structure of carbon films obtained by plasmachemical depositionстатья
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:Carbon films were obtained on nickel and silicon substrates by plasmachernical deposition from a hydrogen-methane gas mixture activated by dc discharge. The deposits were characterized by Raman scattering and scanning electron microscopy. Nanographite films on nickel are formed at a significantly lower substrate temperature and methane concentration in the gas phase than on silicon.