Raman spectrometer for in situ diagnostics of materials in gas discharge plasmaстатья
Информация о цитировании статьи получена из
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Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Местоположение издательства:Road Town, United Kingdom
Первая страница:280
Последняя страница:283
Аннотация:A Raman spectrometer for the in situ diagnostics of materials deposited in a gas discharge plasma is described. The device operates under the conditions of intense spurious emission from the discharge region and heat radiation from a substrate. The spectrometer represents a PC-controlled data acquisition system based on a commercial double-beam grating monochromator MDR-1 and equipped with a pulsed Cu-vapor laser and a lock-in detector. The Raman spectrometer was used to study the growth and modification of polycrystalline diamond films under de discharge conditions. It is demonstrated that the in situ Raman spectroscopic analysis using the proposed device can be used for determining the phase composition acid thickness of deposited carbon films, measuring their temperature and internal stresses, and studying variations of these characteristics during the film growth.