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An in situ Study of the Kinetics of a Solid-Phase Reaction Activated by the Energy of Elastic Stresses Arisen upon the Formation of the Cu/As2Se3 Nanosized Film Structure / Technical Physics Letters, vol. 44, issue 11, pp. 1002-1004, 2018статья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Дата последнего поиска статьи во внешних источниках: 16 января 2019 г.
- Автор: Kogai V.Ya
- Журнал: Technical Physics Letters
- Том: 44
- Номер: 11
- Год издания: 2018
- Первая страница: 1002
- Последняя страница: 1004
- DOI: 10.1134/S1063785018110226
- Аннотация: For the first time, the kinetics of a solid-phase chemical reaction activated by the energy of elastic stresses generated upon the formation of the Cu/As2Se3 nanosized film structure is investigated in situ. It is shown that the time at which a solid-phase chemical reaction starts, as well as the voltage of the Cu/As2Se3 heterolayer, significantly depends on the thickness of the As2Se3 film. At a critical thickness of the As2Se3 film, which is equal to 110 nm, a threshold value of the energy of elastic stresses is achieved. Relaxation of this energy over new defects (micropores and microcracks) generated in the film system leads to the activation of a solid-phase chemical reaction and an increase in its rate. A mechanism of the operation of a positive feedback between the chemical reaction in a solid phase and elastic stresses is proposed.
- Добавил в систему: Когай Владимир Ян-Сунович