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Effect of the Temperature During Deposition of AlOx Films by Spray Pyrolysis on Their Passivating Properties in a Silicon Solar Cellстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
- Авторы: Untila G.G., Kost T.N., Chebotareva A.B., Zaks M.B., Sitnikov A.M., Solodukha O.I.
- Журнал: Semiconductors
- Том: 46
- Номер: 6
- Год издания: 2012
- Издательство: Springer
- Местоположение издательства: New York
- Первая страница: 832
- Последняя страница: 837
- DOI: 10.1134/S1063782612060255
- Аннотация: Abstract—The effect of the deposition temperature of AlOx in the range 330–530°C by spray pyrolysis on the rear surface parameters of silicon (n+pp+)Cz-Si/AlOx solar cells has been studied. It is found that, as the temperature of AlOx deposition is increased, all parameters of the rear surfaces decrease; e.g., the photocurrent density decreases from 25.4 to 24.1 mA/cm2; the photovoltage decreases from 611 to 598 mV; and the efficiency decreases from 12.2 to 10.9%. This indicates that passivation of the p+ type surface with AlOx films becomes less effective. It is concluded that, as the temperature of AlOx deposition is increased, the value of the positive charge incorporated into the nonstoichiometric interphase SiOx layer formed between c-Si and AlOx in the course of AlOx deposition, which brings about screening of the negative charge localized at the AlOx–SiOx interface and, respectively, a decrease in the field-induced passivation, increases.
- Добавил в систему: Унтила Геннадий Григорьевич