Nonlinear analysis of the degree of order and chaos of morphology of porous silicon nanostructuresстатья
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Дата последнего поиска статьи во внешних источниках: 24 января 2020 г.
Аннотация:This work has been done to identify quantitative criteria the degree of order and
chaos morphology of porous layers consisting of silicon nanowire arrays. In order to fulfill the
work, a method of using metal-assisted chemical etching has been utilized to produce
nanowires. There has been done a work of digital processing of porous film images which were
extracted by scanning electron microscope. Informational-entropic and Fourier analysis have
been applied to quantitatively describe the degree of order and chaos in nanostructure
distribution in the layers. Self-similarity of the layer morphology has been quantitatively
described via its fractal dimensions by correlation method. The applied approach for image
processing allows us to distinguish the morphological features of as-called "black" (more
ordered) and "white" (less ordered) silicon layers, which are characterized by minimal and
maximal optical reflection, respectively. From all of the methods of digital techniques that we
have used the method for determining the conditional information of a chaotic set was proved
to be the most informative.