Photoprocesses induced by short-wavelength excimer laser radiation in adsorbed halomethane moleculesстатья
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:Photolysis and desorption induced by ArF and KrCl laser irradiation of CH2I2, CH3I, CCl4, CHCl3, CH2Cl2, CF2Cl2, and CHF2Cl molecules adsorbed on fused silica were studied. One-photon fragmentation, as well as nonlinear dissociation and desorption processes, were observed. It was found that three-step fragmentation is a widespread phenomenon for molecules that experience resonant absorption of laser radiation. To explain the phenomenon, a mechanism based on stimulated emission was proposed. The nonlinear character of desorption is associated with redistribution of absorbed energy in adsorbed molecules and its transfer to the substrate.