Excessive number of high asperities for sputtered rough filmsстатья
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Дата последнего поиска статьи во внешних источниках: 25 августа 2021 г.
Аннотация:The roughness of solids is crucial for interactions between bodies at short separations due to capillary orvan der Waals–Casimir forces and for contact mechanics. Specifically, it is critical for the fabrication andoperation of microelectromechanical systems, for which functional materials are deposited using thin filmcoating technologies. Here, it is demonstrated that the materials deposited by magnetron sputtering or thermallyevaporated on a cold Si substrate reveal a significantly larger number of high asperities than that predicted by thenormal distribution. Such asperities define the distance between the solids in contact that is the key parameterfor many problems. The effect is related to the nonequilibrium deposition conditions and is suppressed if thematerial is deposited on a hot substrate or annealed. The high asperity tails can be described by the extremevalue distribution or in some cases by the exponential distribution.