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Large-area plasmonic structures fabricated by laser nanopatterning and their applicationsстатья
- Авторы: Hong M.H., Liu C.H., Ma F., Chen Z.C., Luk'yanchuk B., Shi L.P., Chong T.C.
- Сборник: SPIE Proceedings
- Том: 7202
- Год издания: 2009
- Место издания: SPIE
- DOI: 10.1117/12.810460
- Аннотация: Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au, Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.
- Добавил в систему: Лукьянчук Борис Семенович