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Smoothing of Polycrystalline AlN Thin Films with Argon Cluster Ionsстатья
- Авторы: Nikolaev I.V., Korobeishchikov N.G., Roenko M.A., Geydt P.V., Strunin V.I.
- Журнал: Technical Physics Letters
- Том: 47
- Номер: 4
- Год издания: 2021
- Издательство: Pleiades Publishing, Ltd
- Местоположение издательства: Road Town, United Kingdom
- Первая страница: 301
- Последняя страница: 304
- DOI: 10.1134/s1063785021030275
- Аннотация: Surface modification of polycrystalline thin films of aluminum nitride using bombardment with an cluster ion beam has been investigated. The treatment has been performed using high-energy (105 eV/atom) and low-energy (10 eV/atom) argon cluster ions. High-efficiency smoothing of the nanostructured surface in a wide range of spatial frequencies (v = 0.02–128 μm–1) at ultrasmall etching depth (<100 nm) is demonstrated by atomic force microscopy with the application of the power spectral density function of roughness.
- Добавил в систему: Гейдт Павел Викторович