|
ИСТИНА |
Войти в систему Регистрация |
ИСТИНА ИНХС РАН |
||
EFFECT OF SUBSTRATE BIAS VOLTAGE PARAMETERS ON SURFACE PROPERTIES OF ta-C COATINGSстатья
- Авторы: Safonov V., Miroshnichenko K., Zykova A., Zavaleyev V., Walkowicz J., Rogowska R.
- Журнал: Problems of Atomic Science and Technology, Series: Plasma Physics
- Том: 23
- Номер: 1
- Год издания: 2017
- Первая страница: 199
- Последняя страница: 202
- Номер статьи: 1562-6016
- Аннотация: The study presents the technology of the formation of amorphous ta-C films, deposited by pulsed vacuum-arc method with the use of a water-cooled electromagnetic Venetian blind plasma filter. The effect of the substrate bias voltage, in the range of -25 to -200 V, on the structural and surface properties of ta-C coatings was analyzed. The strong correlation between surface properties of amorphous ta-C films depending on substrate bias voltage variations and characteristic changes in the content of the diamond-like sp3 fraction was observed.
- Добавил в систему: Завалеев Виктор Анатольевич