Plasma parameters & rf power coupling mechanism to the low pressure rf inductive discharge

Alexandrov, A.F.; Kralkina, E.A.; Nekludova, P.A.; Pavlov, V.B.; Petrov, A.K.; Rukhadze, A.A.; Vavilin, K.V.

Авторы: Alexandrov A.F., Kralkina E.A., Nekludova P.A., Pavlov V.B., Petrov A.K., Rukhadze A.A., Vavilin K.V.
Сборник: Book of Abstracts 4th Workshop on Radio Frequency Discharges
Тезисы
Год издания: 2013
Место издания: France
Первая страница: 23
Последняя страница: 23
Аннотация: The paper represents the results of many years work in the field of both theoretical and experimental study of the efficiency of RF power absorption by the low pressure inductive discharge plasma. The systematic study of the dependencies of plasma absorption ability on the plasma density, the elastic collisional frequency, the dimensions of the plasma source and the external magnetic field value was carried out. CONCEPT OF THE EQUIVALENT PLASMA RESISTANCE The expression [1]: (1) determines the relationship between power absorbed by plasma and RF electric field components. All RF electric fields generated in plasma of inductive discharge are proportional to antenna current I. Thus the power Ppl absorbed in plasma is defined by a square of the current through antenna I, and multiplier Rpl, having dimensionality of resistance: Ppl =1/2 Rpl I2, (2) Multiplier Rpl is worth to name as equivalent plasma resistance. It can be treated as a value characterizing the ability of plasma to absorb RF power. GENERAL FEATURES OF PLASMA EQUIVALENT RESISTANCE Theoretical consideration as well as experimental results [2,3] showed that as a whole the dependence of Rpl on plasma density is non-monotonous due to the competition of two factors, i.e. growth of the number of electrons participating in power absorption with plasma density increase ne and decrease of this number due to the decrease of skin width. In the realm of low electron densities (ne<<1011cm-3) Rpl can be approached by the data calculated [3] for the case of weak spatial dispersion while in the realm of high electron densities ne>>1011cm-3 where the conditions of the anomalous skin effect take place Rpl can be approached by the data [3] calculated for the case of strong spatial dispersion Calculations showed that at the Ar pressure of 0.1mTorr the RF power is coupled to plasma due to collisionless Cherenkov power absorption mechanism. The increase of the Ar pressure leads to the rise of contribution of the collisional mechanism to the RF power absorbtion, so at pressures higher than 1mTorr it becomes predominant. Here the Rpl values are controlled by the frequency of elastic collisions. In case when RF inductive discharge is located in the external magnetic field the dependence of Rpl values on the external magnetic field B induction shows the presence of a number of local maxima appearing due to the resonance conditions of the coupled helicon and TG waves excitation [2,3]. The analysis shows that at low Ar pressures the collisionless Landau damping mechanism is responsible for RF coupling to plasma. Calculations bring that it is the absorption of TG wave that contributes to the Rpl values. REFERENCES. 1. Ginzburg V.L., Rukhadze A.A., “Waves in magnetized plasma”. Science, (1970). 2. Kralkina E.A. Physics-Uspekhi (Advances in Physical Sciences), 178 519–540 (2008). 3. Vavilin K.V., Rukhadze A.A., Lee M.X.,.Plaksin V.Yu.,Technical Physics , 74, N5, 44-49 (2004); 74, N6, 25-28 (2004); 74, N6, 29-34 (2004).
Добавил в систему: Петров Александр Кириллович

	ИСТИНА	Войти в систему Регистрация
	ИСТИНА ИНХС РАН
	Главная Поиск Статистика О проекте Помощь

ИСТИНА

ИСТИНА ИНХС РАН

Plasma parameters & rf power coupling mechanism to the low pressure rf inductive dischargeтезисы доклада

Прикрепленные файлы