Аннотация:To obtain the metal coatings having some special characteristics, the magnetron sputtering is necessary. If the substrates represent particles of micron size it is possible to use trap existing in an RF plasma for effective agitating and confining the particles. One of the problems here is the influence of the powerful magnetron discharge onto the RF plasma. Particularly it is known that the plasma potential and electric field in the sheaths can drop so the trap can be destroyed. In the work the particles of micron size were confined in the RF plasma inside the discharge box. The magnetron sputter was placed near the box and the sputtered atoms could be directed into the intrinsic volume through the special window. The replaceable balanced and unbalanced magnetic systems were used in different experiments. The cross-section forms of the dusty clouds were observed and the concentration of the particles was measured. The dusty clouds having maximal volume with particle concentration more than 10E4 were formed in the plasma-box at gas pressures in the range of 5*10Е-4 - 10Е-3 Torr. It was found out that the running balanced sputter caused the minor influence onto the cloud parameters comparing to the unbalanced one.