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Formation of thin silicon films on soda-lime silica glass surface by magnetron sputtering depositionстатья
Информация о цитировании статьи получена из
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 20 июня 2024 г.
- Авторы: Klimovich I.M., Stepanov A.L.
- Журнал: Optoelectronics and Advanced Materials, Rapid Communications
- Том: 17
- Номер: 3-4
- Год издания: 2023
- Издательство: Institutul National de Cercetare-Dezvoltare pentru Optoelectronica
- Местоположение издательства: Romania
- Первая страница: 165
- Последняя страница: 169
- Аннотация: Magnetron high-power impulse sputtering was used for deposition of H2-free amorphous thin Si films in Ar atmosphere on a flat surface of soda-lime silicate glass at different values of the substrate temperature and bias potential to glass. The surface morphology of the deposited films and their transverse structure were studied by scanning electron and atomic- force microscopy. For various deposition regimes, the appearance on the film surface spherical craters with diameters of several hundred nanometers and Si nanowires towering over a film were observed. The degree of transparency of the films in the visible spectral range was also analyzed. This work demonstrates that magnetron sputtering offers a good potential for depositing the transparent films for silicon-based photonics.
- Добавил в систему: Степанов Андрей Львович