Аннотация:A model of heating optical multilayer coatings by laser radiation, oriented towards massive parallel computing, is proposed and applied to thin TiO2 − SiO2 films. The absorption of laser energy is taken into account by increasing the temperature of the absorption region. Shortpulse and long-pulse heating regimes are studied. Using large-scale atomistic clusters, changes in film density, refractive index, concentration of point defects and mechanical stresses due to heating are calculated. The parameters chosen for modeling provide high computational efficiency.