FIB-fabricated complex-shaped 3D chiral photonic silicon nanostructuresстатья
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Дата последнего поиска статьи во внешних источниках: 26 декабря 2017 г.
Аннотация:Technologies capable of fabricating complex shaped silicon metasurfaces attract increasing attention. The focused ion beam fabrication technique is considered traditionally as causing thick damaged layers in silicon resulting in a significant rise of the optical absorption loss. We examine the structure of the FIB-fabricated nanostructures on the silicon-on-sapphire (SOS) platform and its optical characteristics before and after thermal oxidation. We show that being thermally oxidised the FIB-patterned silicon subwavelength nanostructure tends to regain its chiral optical features. The impact of the oxidation process on the silicon nanostructure optical behaviour is discussed.