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Статьи в журналах
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- 2018 Low-k protection from F radicals and VUV photons by multilayer pore grafting approach
- Zotovich Alexey, Rezvanov Askar, Chanson Romain, Zhang Lin, Hacker Nigel, Kurchikov Konstantin Alekseevich, Klimin Sergey, Zyryanov S.M., Lopaev D., Gornev Evgeny, Clemente Iosif, Miakonkikh Andrew, Maslakov K.I.
- в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 51, № 32, с. 325202 DOI
Тезисы докладов
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- 2018 Gas Phase Pore Stuffing for Damage Mitigation during Plasma Etching
- Yamaguchi T., Nozawa S., Fujikawa M., Marneffe J.F de, Chanson R., Gavan K.B., Rezvanov A., Lazzarino Fr
- в сборнике Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials, издательство Japan Soc of Applied Physics (Japan), тезисы DOI
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- 2018 Gas Phase Pore Stuffing for the protection of organo-silicate glass dielectric materials
- Fujikawa M., Sato N., de Marneffe J.F., Chanson R., Gavan K.Babaei, Rezvanov A., Lazzarino F., Tokei Z., Yamaguchi T., Nozawa S.
- в сборнике 2018 International Symposium on Semiconductor Manufacturing (ISSM), место издания IEEE, тезисы DOI