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Статьи в журналах
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- 2020 Non-linear Raman shift-stress behavior in top-down fabricated highly strained silicon nanowires
- Spejo L.B., Arrieta-Concha J.L., Puydinger dos Santos M.V., Barros A.D., Bourdelle K.K., Diniz J.A., Minamisawa R.A.
- в журнале Journal of Applied Physics, издательство AIP Publishing (United States), том 128, № 4 DOI