ИСТИНА

Babin S.

Соавторы: Кузьмин И.Ю., Борисов С.С., Ito H., Ivanchikov A., Suzuki M., Abe H., Hakii H., Hamaguchi A., Hudek P., Kadowaki M., Miyano Y., Nishiyama Y., Yamabe M. показать полностью..., Yamashita H., Yamazaki Y., Yonekura I., Butomo V., Christophe P., Kwon G., Lee C.H., Matison D., Mun D.Y., Ocola L.E., Oh J.H., Peter Y., Yoo H.W., Грачев Е.А., Милицин В.О., Платоненко В.Т., Черёмухин Е.А.

25 статей, 1 доклад на конференции, 1 членство в редколлегии журнала

Количество цитирований статей в журналах по данным Web of Science: 157, Scopus: 178

IstinaResearcherID (IRID): 3839806

Деятельность

• Статьи в журналах

  • 
    • 2010 Simulation of scanning electron microscope images taking into account local and global electromagnetic fields
    • Babin S., Borisov S., Ito H., Ivanchikov A., Suzuki M.
    • в журнале Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, издательство AIP Publishing (United States), том 28, с. C6C41
  • 
    • 2009 Contrast reversal effect in scanning electron microscopy due to charging
    • Abe H., Babin S., Borisov S., Hamaguchi A., Kadowaki M., Miyano Y., Yamazaki Y.
    • в журнале Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, издательство AIP Publishing (United States), том 27, с. 1039-1046
  • 
    • 2008 CHARIOT: software tool for modeling SEM signal and e-beam lithography
    • Babin S., Borisov S., Ivanchikov A.
    • в журнале Physics procedia, издательство Elsevier (United States), том 1, № 1, с. 305-313
  • 
    • 2006 EBL resist heating error and its correction
    • Sergey Babin, Igor Kuzmin
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 6283, с. 62831Q DOI
  • 
    • 2004 Control of the angular structure of high-order harmonics
    • Batebi S., Platonenko V.T.
    • в журнале Quantum Electronics, издательство Turpion - Moscow Ltd. (United Kingdom), том 34, № 1, с. 71-74 DOI
  • 
    • 2004 Thermal analysis of diamondlike carbon membrane masks in projection electron-beam lithography
    • Babin S., Butomo V., Kuzmin I.Yu, Yamashita H., Yamabe M.
    • в журнале Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, издательство AIP Publishing (United States), том 22, № 6, с. 3082-3086
  • 
    • 2003 Thermal analysis of projection electron beam lithography using complementary mask exposures
    • Babin S., Kuzmin I., Yamashita H., Yamabe M.
    • в журнале Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, издательство AIP Publishing (United States), том 21, № 6, с. 2691-2696
  • 
    • 2002 Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions
    • Babin Sergey V., Kuzmin Igor Y.
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 4562, с. 545-551
  • 
    • 2001 Comprehensive simulation of electron-beam lithography processes using PROLITH/3D and TEMPTATION software tools
    • Sergey Babin, Kuzmin Igor Yu, Mack Chris A.
    • в журнале Microelectronic Engineering, издательство Elsevier BV (Netherlands), том 57, с. 343-348
  • 
    • 1999 Simulation and measurement of resist heating in multipass exposure using a 50 kV variably shaped beam system
    • Babin S., Hartmann H., Kuzmin I.Yu
    • в журнале Microelectronic Engineering, издательство Elsevier BV (Netherlands), том 46, № 1-4, с. 231-234
  • 
    • 1998 Comparative study of resist heating and proximity effect influence on CD variation in 30 kV EBL
    • Babin S., Hudek P., Kostic I., Kuzmin I.Yu
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 3331, с. 83
  • 
    • 1998 Experimental verification of the TEMPTATION (temperature simulation) software tool
    • Babin S., Kuzmin I.Yu
    • в журнале Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, издательство AIP Publishing (United States), том 16, № 6, с. 3241-3247
  • 
    • 1998 Software for Temperature Simulation (TEMPTATION) in Electron-Beam Lithography
    • Babin S., Kuzmin I.Yu, Sergeev G.
    • в журнале Microelectronic Engineering, издательство Elsevier BV (Netherlands), том 41, с. 191
  • • 1997 CD-Variation in 30 kV EBL due to Resist Heating: Experiment and Simulation
    • Babin S., Hudek P., Kostic I., Kuzmin I.Yu
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 3048, с. 368
  • 
    • 1997 Simulation of Resist Heating in Electron Beam Lithography
    • Babin S., Kuzmin I.Yu
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 3048, с. 374
  • 
    • 1997 Software Tool for Temperature Simulation in Electron Beam Lithography: TEMPTATION
    • Babin S., Kuzmin I.Yu, Sergeev G.
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 3236, с. 464
  • 
    • 1996 Advanced model for resist heating effect simulation in electron beam lithography
    • Babin S., Kozunov V., Kuzmin I.
    • в журнале Proceedings of SPIE - The International Society for Optical Engineering, издательство SPIE, the International Society for Optical Engineering (Bellingham, WA, United States), том 2884, с. 520

• Статьи в сборниках

  • 
    • 2012 CD-Metrology of EUV masks in the presence of charging: measurement and simulation
    • Babin S., Borisov S., Hakii H., Nishiyama Y., Yonekura I.
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с. 844108 DOI
  • 
    • 2012 CD-Metrology of EUV masks in the presence of charging: measurement and simulation
    • Babin S., Borisov S., Hakii H., Nishiyama Y., Yonekura I.
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с. 844108 DOI
  • • 2012 CD-SEM and e-beam defect inspection of high-aspect ratio contact holes: measurement and simulation of precharge
    • Babin S., Borisov S., Kwon G., Lee C.H., Oh J.H., Mun D.Y., Yoo H.W.
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering DOI
  • 
    • 2012 Challenges of SEM metrology at sub-10nm linewidth
    • Babin S., Borisov S., Christophe Peroz, Peter Yushmanov
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с. 83240T DOI
  • 
    • 2010 Comprehensive simulation of SEM images taking into account local and global electromagnetic fields
    • Babin Sergey, Borisov Sergey S., Ito Hiroyuki, Ivanchikov Andrei, Matison Dmitri, Militsin Vladimir, Suzuki Makoto
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с.  77290W-77290W-6
  • 
    • 2010 Optimizing the detector configuration for SEM topographic contrast by using a Monte Carlo simulation
    • Suzuki Makoto, Borisov S., Ito Hiroyuki, Babin Sergey;
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с. 772910-772910-7 DOI
  • 
    • 2008 Experiment, simulation of charging effects in SEM
    • Babin S., Borisov S., Miyano Y., Abe H., Kadowaki M., Hamaguchi A., Yamazaki Y.
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с. 692219-692219-7
  • 
    • 2003 Software tool for advanced Monte Carlo simulation of electron scattering in EBL and SEM: CHARIOT
    • Babin S.V., Borisov S.S., Cheremukhin E.A., Grachev E.A., Korol V., Ocola L.E.
    • в сборнике Proceedings of SPIE - The International Society for Optical Engineering, с. 583-590 DOI

• Доклады на конференциях

  • • 2000 An advanced Monte Carlo model of electron scattering in EBL involving fast secondary and true secondary electrons
    • Авторы: Shiriaev A., Грачев Е.А., Babin S., Борисов С.С.
    • EIL-14P. Micro-and-Nano Engineering 2000, Jena, Germany, Германия, 2000

• Участие в редколлегии журналов

  • • с 1 ноября 2014 Фотоника